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Title:
【発明の名称】ポジチブ及びネガチブ処理感放射線混合物及びレリーフパターンの作製方法
Document Type and Number:
Japanese Patent JP2675138
Kind Code:
B2
Abstract:
The invention relates to positive-and negative-working radiation-sensitive mixtures and to processes for the formation of relief patterns. The radiation-sensitive mixtures contain a polymeric binder and an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid, and one additional grouping which forms a strong acid under the action of radiation, the polymeric binders used being reaction products of polymers containing phenolic hydroxyl groups with dihydropyran or alkyl vinyl ethers. These radiation-sensitive mixtures are particularly suitable for the formation of relief patterns.

Inventors:
Reinhold, Schwarm
Horst, binder
Application Number:
JP11525689A
Publication Date:
November 12, 1997
Filing Date:
May 10, 1989
Export Citation:
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Assignee:
BASF Akchen Gezel Shaft
International Classes:
C08F8/00; C08F12/22; C08G8/28; C08G8/36; C08K5/372; C08L25/18; G03F7/023; C08L61/08; C09D125/18; C09D161/08; G03F7/004; G03F7/038; G03F7/039; G03F7/38; H01L21/027; (IPC1-7): G03F7/004; G03F7/004; G03F7/038; G03F7/039; G03F7/38
Domestic Patent References:
JP6238450A
JP60175046A
JP5236442B2
Attorney, Agent or Firm:
Tajiro Taiji