Title:
【発明の名称】高光沢と高衝撃強さを共に持つ双峰HIPSを現場製造する方法
Document Type and Number:
Japanese Patent JP2001525886
Kind Code:
A
Abstract:
A continuous bulk polymerization process for making a high gloss, high impact strength polystyrene based resin having a bimodal particle size distribution containing capsule particles having an average size of 0.2 to 0.6 microns and cellular particles having an average particle size of 1.2 to 8.0 microns. The process comprises three reaction zones in series where styrene and a styrene-butadiene copolymer are fed to the first reaction zone which is maintained at pre-phase inversion conditions and no particles are allowed to form. The capsule particles form in the second reaction zone which is maintained at post-phase inversion conditions. Polybutadiene is introduced into the third reaction zone which is also maintained at post-phase inversion conditions. The cellular morphology particles form in the third reaction zone. The resultant bimodal particle size polymer mixture may be subjected to devolitilization after the third reaction zone or, alternatively, the mixture can be subjected to further polymerization in one or more finishing reactors prior to polymerization.
Inventors:
Bowen, Kenneth, Yee.
Hanner, Michael, Jay.
Hanner, Michael, Jay.
Application Number:
JP55035098A
Publication Date:
December 11, 2001
Filing Date:
March 31, 1998
Export Citation:
Assignee:
Chevron Chemical Company LLC
International Classes:
C08F2/00; C08F279/02; C08F287/00; C08L51/04; C08L53/02; (IPC1-7): C08F279/02
Attorney, Agent or Firm:
Akira Asamura (3 outside)