Title:
PLASMA CVD APPARATUS
Document Type and Number:
Japanese Patent JPH0758027
Kind Code:
A
Abstract:
PURPOSE: To improve the film formation rate of a thin film by forming a magnetic field of a horizontal direction to counter surfaces of a pair of electrodes between the electrodes, concentrating a plasma between the electrodes by an operation of the magnetic field, and enhancing a plasma density.
CONSTITUTION: A magnetic field is formed by a magnet contained in a bottom electrode 8 is formed around the electrode 8 in a can roll counter electrode type CVD apparatus. A plasma is concentrated between the electrode 8 and an upper electrode 5 by the field. A plasma density is enhanced. Accordingly, raw material gas introduced between the electrodes 5 and 8 is efficiently excited, chemically reacted to rapidly form a thin film.
Inventors:
HIRATSUKA RYOICHI
ONODERA SEIICHI
UCHIYAMA HIROSHI
SATO KENICHI
CHIBA KAZUNOBU
ONODERA SEIICHI
UCHIYAMA HIROSHI
SATO KENICHI
CHIBA KAZUNOBU
Application Number:
JP20220293A
Publication Date:
March 03, 1995
Filing Date:
August 16, 1993
Export Citation:
Assignee:
SONY CORP
International Classes:
C23C14/34; C23F4/00; H01L21/205; (IPC1-7): H01L21/205; C23C14/34; C23F4/00
Attorney, Agent or Firm:
Akira Koike (2 outside)
Next Patent: SAMPLE STAND FOR ECR-CVD APPARATUS