PURPOSE: To prevent the electrification by charge accumulation and static electricity at the time of electron beam plotting with simple film constitution by providing the surface of a transparent substrate with a specific translucent film in a single layer form for the purpose of forming light transparent parts.

CONSTITUTION: This halftone type phase shift mask blank is constituted by forming the translucent film 2a on the transparent substrate 1 and this halftone type phase shift mask is constituted by subjecting the translucent film 2a of the halftone type phase shift mask blank to a patterning treatment to remove a part along the prescribed patterns to form the mask patterns composed of the light translucent parts 2 and the light transparent parts 3. The transparent substrate 1 is a quartz glass substrate subjected to mirror polishing on its main surface. Such translucent film 2a of the single layer form has a property to allow the transmission of light of the intensity not substantially contributing to exposing and a property to shift the phase of the exposing light by a prescribed quantity and simultaneously has an electric conductivity to the extent of not electrifying the charges or above at the time of electron plotting in combination.