Title:
X-RAY MASK TRANSFER APPARATUS
Document Type and Number:
Japanese Patent JPS6142915
Kind Code:
A
Abstract:
PURPOSE:To perform positioning in high accuracy by a method wherein a substrate stage is controlled so that the output of an X-ray sensor located at the back side of a substrate indicates max. when X-ray is exposed on only each mark part of an X-ray transfer mask and a semiconductor substrate by using an X-ray shutter. CONSTITUTION:X-ray from an X-ray generator 4 is given to a mark 10a of a mark 2 and a mark 8b of a semiconductor substrate 1 through an aperture 3a of a shutter 3, the X-ray beam of a small diameter is given to an X-ray sensor 5. A controller 7, using the sensor output signal, controls a substrate stage so that the max. sensor signal output is obtained. Thereby, positioning in high accuracy within a short time is enabled by using the X-ray from the X-ray generator to be used for transfer.
Inventors:
SHIRAKAWA AKIRA
Application Number:
JP16538184A
Publication Date:
March 01, 1986
Filing Date:
August 06, 1984
Export Citation:
Assignee:
SANYO ELECTRIC CO
International Classes:
G03F7/20; H01L21/027; H01L21/30; (IPC1-7): G03F7/20; H01L21/30
Attorney, Agent or Firm:
Takuji Nishino
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