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Patent Searching and Data


Title:
VAPOR DEPOSITION METHOD ON FILM
Document Type and Number:
Japanese Patent JPS6017073
Kind Code:
A
Abstract:

PURPOSE: To solve problems during vapor deposition on a polyether sulfone or polysulfone film due to the properties of the film by superposing a film contg. little volatile matter on the polysulfone film before vapor deposition.

CONSTITUTION: A film 9 contg. little volatile matter is superposed on a polyether sulfone or polysulfone film 8, and the resulting laminated film 4 is sent to the lower part of a cooling drum 2 from an unwinder 1 through a suitable guide roll 5. A metal, a metallic oxide or the like evaporated from a vapor deposition source 7 is deposited on the filmlike substrate 8, and the film 4 is wound around a winder 3 through a guide roll 6. Since the film 9 has high lubricity and superior blocking resistance, the film 4 is not creased during winding, and the vapor-deposited film does not stick to the film 9 even after rewinding.


Inventors:
ISOMATSU NORIO
YAMAMOTO KATSUZOU
Application Number:
JP12230983A
Publication Date:
January 28, 1985
Filing Date:
July 07, 1983
Export Citation:
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Assignee:
DAICEL CHEM
International Classes:
C23C14/20; C23C14/56; (IPC1-7): C23C14/56
Domestic Patent References:
JP46018640A