PURPOSE: To form a thin film thermal head capable of coping with the enhancement in preciseness and the acceleration of a speed and having long life by reducing difference in level, by partially lowering the specific resistance of a heat generating resistor and using said part as an electrode.
CONSTITUTION: The part other than the heat generating part of a heat generating resistor is reduced in its specific resistance. For example, a Cr-Si thin film 1 is formed on a ceramic substrate 8 as the heat generating resistor and, thereafter, a Cr thin film 3a is formed as a first electrode layer and an Al thin film 3b is succeedingly formed as a second electrode layer. In the next step, the second electrode layer (Al thin film) 3b and the first electrode layer (Cr thin film) 3a are partially removed by photoetching to form a pattern. In this pattern, the second electrode layer (Al thin film) 3b comes to an original one while the exposed heat generating resistor 1 comes to a heat generating part. The exposed first electrode layer (Cr thin film) 3a is diffused into the overlapped heat generating resistor 1 (Cr-Si thin film).
MORI YOSHIHARU
KAMEI TSUNEAKI
KAWAHITO MICHIYOSHI
YABUSHITA AKIRA
| JPS57109673A | 1982-07-08 |