PURPOSE: To prevent uneven development due to attachment of solid matters, such as dust, and foams during development processing by incorporating a copolymer contg. as copolymn. components, ethyl methacrylate, methyl methacrylate, and methacrylic acid, as a matting agent in the outermost layer of a silver halide color photosensitive material.

CONSTITUTION: Uneven development due to attachment of solid matters, such as dust, and foams during development processing can be prevented by copolymerizing ethyl methacrylate (EMA), methyl methacrylate (MMA), and methacrylic acid (MAA) in the molar proportion ratio of (EMA+MMA)/MMA=5/5W 9/1, and EMA/MMA=9/1W1/9, to form a ternary polymer having a mol.wt. of 5,000W1,000,000, dissolving it in a low-boiling org. solvent, adding it into an aq. gelatin soln. to disperse it into globules having 0.2W10μm diameters, coating the silver halide color photosensitive material with this soln. to form its outermost layer.