PURPOSE: To obtain a liquid display device which has nonline elements of metal- insulating film-metal (MIM) structure economically by employing a lithographing method which utilizes a self-matching stage.

CONSTITUTION: A thin film 10 of tantalum provided on a glass substrate 9 in a specific pattern is treated by anode oxidation to form an oxidized film 11 on its surface. Then, a thin ITO (In2O3+SnO2) film 12 is provided over the entire surface of the substrate and coated with negative photoresist 13, and the substrate 9 is exposed on the rear side. This substrate is developed and the thin ITO film 12 is etched away through the hole part of the formed resist 13; and the remaining resist 13 is also removed and the ITO film 12 is etched into a shape of necessary picture elements 14, thus forming the MIM structure consisting of the thin tantalum film 10, oxidized film 11, and a picture element electrode 14. Then, a substrate provided with striped transparent electrodes is combined with said substrate 9 to form the liquid crystal display device.