Title:
MESA TYPE SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
Document Type and Number:
Japanese Patent JPS595631
Kind Code:
A
Abstract:
PURPOSE:To eliminate an adverse effect such as an application unevenness on processes by forming the side wall section of a groove in two-stage structure and forming a porjecting coating section, around which glass fines round, into the lower groove from the surface of a substrate. CONSTITUTION:A window l2 for etching in relationship narrower than the width l1 of an opening window is formed to a groove section 4 in a corrosion-resisting film 7 on a novel oxide film 3' coating the semiconductor substrate 1 through heat treatment. A second groove 4' penetrating a P-N junction in depth deeper than the groove section 4 is formed in two-stage structure through etching through window l2. A glass coating 5 is applied and formed to the groove section 4' through an electrophoresis method. A projecting section 6 is formed at the top section of the end of the groove section of the glass coating 5 through baking treatment, but there is the projecting section in the surface of a surface region low by one stage, the section can be formed so that it is not projected to the flat surface of the semiconductor substrate 1, and it does not hinder a mask process.
Inventors:
YAMAGUCHI TSUNEO
UMEGAKI TAKESHI
KAWAKAMI YORISADA
UMEGAKI TAKESHI
KAWAKAMI YORISADA
Application Number:
JP11485482A
Publication Date:
January 12, 1984
Filing Date:
July 01, 1982
Export Citation:
Assignee:
MATSUSHITA ELECTRONICS CORP
International Classes:
H01L21/316; (IPC1-7): H01L21/316
Attorney, Agent or Firm:
Toshio Nakao
Next Patent: MANUFACTURE OF SEMICONDUCTOR ELEMENT