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Patent Searching and Data


Title:
PHOTOCHEMICAL SURFACE TREATMENT DEVICE
Document Type and Number:
Japanese Patent JPS607936
Kind Code:
A
Abstract:

PURPOSE: To realize effective incidence of radiation from a source of the radiation by evacuating the optical path from the source to optical window on a reaction chamber or by constituting the optical path with gas having no absorptivity for the radiation.

CONSTITUTION: An optical window 3 capable of transmitting radiation having selected wavelength and/or within a specified wavelength region is provided to a reaction chamber 10 which can be held in the gas-tight state in a device for photochemically activating specified gas and performing specified tratment on the surface of a substrate 9, and a charging device 6 and exhaust device 7 for the gas are provided to the reaction chamber 10. Further, a source 2 for generating radiation with specified wavelength and/or within specified wavelength region, and if necessary a means for selecting the wavelength are provided, and a vacuum chamber or a gas-tight chamber 1 for filling selected gas is also provided between the source 2 and the reaction chamber 10. Namely, the optical path between the source and the optical window 3 is evacuated or constituted with gas having no absorptivity for radiation to enable efficient incidence of radiation from the source into the reaction chamber.


Inventors:
SEKIGUCHI ATSUSHI
HIRAGA TAKASHI
NAGASAKA MICHIO
Application Number:
JP11410083A
Publication Date:
January 16, 1985
Filing Date:
June 24, 1983
Export Citation:
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Assignee:
ANELVA CORP
International Classes:
B01J19/12; B29C59/14; B29C71/04; C08J7/00; H01L21/205; H01L21/302; H01L21/3065; (IPC1-7): C08J7/00
Domestic Patent References:
JPS4737008U1972-12-23
Attorney, Agent or Firm:
Kenji Murakami