Title:
WAFER TRANSFER DEVICE
Document Type and Number:
Japanese Patent JPS60186033
Kind Code:
A
Abstract:
PURPOSE:To simplify the operation, to shorten the time and to improve the productivity by transferring a treated wafer and untreated wafer while maintaining a susceptor placed on an elevator plate, and eliminating the steps of transferring the susceptor and returning the susceptor. CONSTITUTION:A treated wafer and untreated wafer are transferred on a susceptor in a treating unit for vapor phase growing, etching, sputtering and depositing, a two-stage retainer 12 disposed at an interval of the thickness of a wafer with two flat plates at the end of a holding rod 13 horizontally slidable by passing airtightly on the outer wall of a transfer device, and a transfer plate 14 elevationally rotatably supported with a wafer transferring projection 41 of the lower surface at the end of the rod inserted with a lifting rod slidably in the horizontal direction airtightly through the outer wall of the device are disposed oppositely at both sides of the susceptor 5 along the upper surface of the susceptor disposed in the furnace. The plate 14 is horizontally moved oppositely to the tray 12, and rotated by the operation of a raising rod 153 shown by an arrow at the pin 151 as a fulcrum.
Inventors:
UEMATSU KUNIMASA
MATSUMOTO ISAO
MATSUMOTO ISAO
Application Number:
JP4171384A
Publication Date:
September 21, 1985
Filing Date:
March 05, 1984
Export Citation:
Assignee:
NIPPON OXYGEN CO LTD
International Classes:
H01L21/205; H01L21/31; H01L21/67; H01L21/677; H01L21/68; (IPC1-7): H01L21/205; H01L21/31
Attorney, Agent or Firm:
Kenichiro Kido