Title:
COPOLYMER CONTAINING PERFLUOROALKYL GROUP, MANUFACTURE AND RADIOSENSITIVE COPYING LAYER
Document Type and Number:
Japanese Patent JPS619415
Kind Code:
A
Abstract:
Copolymers comprising perfluoroalkyl groups, reproduction layers containing these copolymers and use thereof for waterless offset printing. The novel perfluoroalkyl group-containing copolymers are prepared from at least two different monomers, monomer (a) comprising acryloyl or methacryloyl groups and phenolic OH groups and monomer (b) comprising acryloyloxy, methacryloyloxy or vinyl groups and a perfluoroalkyl group. Monomer component (a) can, for example, be prepared from a hydroxybenzoic acid by esterification with a hydroxyalkyl-acrylate. The novel copolymers are, in particular, used as binders in radiation-sensitive reproduction layers which additionally contain at least one radiation-sensitive compound. Reproduction layers of this kind are used as radiation-sensitive coatings of support materials for printing plates used in waterless offset printing.
Inventors:
BUERUNAA HAA MIYURAA
ARUNORUTO SHIYUNERAA
ARUNORUTO SHIYUNERAA
Application Number:
JP12288085A
Publication Date:
January 17, 1986
Filing Date:
June 07, 1985
Export Citation:
Assignee:
HOECHST AG
International Classes:
C08F20/00; C08F20/10; C08F20/22; C08F20/26; C08F212/00; C08F212/14; C08F220/24; C08F220/30; C08F220/34; C08F220/36; C08F220/40; G03F7/004; G03F7/023; (IPC1-7): C08F212/14; C08F220/24; C08F220/30; C08F220/34; C08F220/40
Domestic Patent References:
| JPS58209984A | 1983-12-07 | |||
| JPS5998113A | 1984-06-06 | |||
| JPS58215410A | 1983-12-14 |
Attorney, Agent or Firm:
Toshio Yano
Next Patent: PRODUCTION OF COPOLYMER