PURPOSE: To prevent the deterioration of a chelate resin, by adsorbing Ga to a chelate resin at a low temperature, and washing the chelate resin e.g. with a dilute aqueous solution of an acid prior to the elution of Ga from the resin with an eluent.
CONSTITUTION: A chelate resin having Ga-adsorbing capability is made to contact with an aqueous solution of sodium aluminate containing Ga at ≤80°C to effect the adsorption of Ga to the chelate resin. The resin adsorbed with Ga is washed with water or a dilute aqueous solution of an acid. The washed Ga- adsorbed resin is treated with an eluent (hydrochloric acid, sulfuric acid, nitric acid, etc.) to elute the adsorbed Ga. The above process prevents the reaction of the base in the chelate resin with the eluent and consequently the deterioration of the functional group of the resin with the heat of reaction, and elongates the life of the chelate resin.
MATSUDA KIMIAKI
OCHI KENJI
AOI MASAHIRO
CHINO KUNITAKE
