Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JPS5974554
Kind Code:
A
Abstract:

PURPOSE: To obtain a photosensitive material having superior antistatic property, by incorporating a nonionic surfactant contg. a polyoxyethylene group and a specified fluorine-contg. anionic surfactant in a hydrophilic colloidal layer.

CONSTITUTION: In one or more hydrophilic colloidal layers formed on a support, such as polyethylene terephthalate film, there are incorporated with (A) a nonionic surfactant having a polyoxyethylene group such as compds. of formula I , II; and (B) a fluorine-contg. anionic surfactant having general formula III in which Rf is 2W10C perfectly or partially fluorinated alkyl; A is CO or SO2; R' is H or lower alkyl; B is carboxylic or sulfonic group or their salt; x and y are each 0 or 1; z is 0 or a positive integer, such as compds. of formulae IV and V. As a result, a potosensitive material having superior antistatic property is obtained.


Inventors:
CHINO NAOYOSHI
NAKAO HIDENORI
Application Number:
JP18568282A
Publication Date:
April 27, 1984
Filing Date:
October 21, 1982
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
C09K3/16; G03C1/85; (IPC1-7): C09K3/16