Title:
ALIGNMENT DEVICE OF PRINTING EQUIPMENT
Document Type and Number:
Japanese Patent JPS5831526
Kind Code:
A
Abstract:
PURPOSE:To form simple structure requiring no special scanning means in an optical system by a method wherein a change in the relative position of a reference mark on an approached photo mask and that on a wafer is obtained as a direct signal in manufacturing a semiconductor device such as ICs. CONSTITUTION:A photo mask 101 and a wafer 102 are faced at an extremely slight interval and alignment reference marks 103 and 104 are respectively provided at the photo mask 101 and the wafer 102. Reflected light from the marks illuminated by a lamp 106 is received by a condensing lens 105, and a photoelectric element 109a through a light dividing mirror 107 like a semitransmission mirror. A passing pulse signal is produced by a detection means 109b and is received by a control circuit means 110, and the position of a stage 112 is read by a moving position reader 113 to negatively run a motor 111 after memorizing the position. The moment matching the reference mark can directly be detected and high-accuracy alignment can be done with a few error at a relatively short time.
Inventors:
SHINOYAMA NOBUYA
HAZAMA JIYUNJI
HAZAMA JIYUNJI
Application Number:
JP12962781A
Publication Date:
February 24, 1983
Filing Date:
August 19, 1981
Export Citation:
Assignee:
NIPPON KOGAKU KK
International Classes:
G03F7/20; H01L21/027; H01L21/30; (IPC1-7): H01L21/30
Domestic Patent References:
| JPS51120180A | 1976-10-21 | |||
| JPS5331972A | 1978-03-25 | |||
| JPS5381082A | 1978-07-18 | |||
| JPS51116942U | 1976-09-22 | |||
| JPS53135082A | 1978-11-25 |
Attorney, Agent or Firm:
Takao Watanabe