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Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN
Document Type and Number:
Japanese Patent JPS6036503
Kind Code:
A
Abstract:

PURPOSE: The titled resin that is obtained by reaction of a specific chalcone derivative with a polymer or copolymer bearing alcoholic hydroxyls, thus giving photosensitive membranes of high toughness, high adhesion, high sensitivity and high chemical stability, having specific groups, by forming the polymer into films on a support.

CONSTITUTION: The objective resin having at least one of the group of formula IIis obtained by reaction between a chalcone derivative of formula I (one of R1 and R2 is oxo-methylene bond and the other is single bond; R3 is H, alkyl, cyano, nitro, alkoxy, alkoxycarbonyl, halogen) such as 4-carboxychalcone and a polymer or copolymer bearing alcoholic hydroxyls such as polyvinyl alcohol, preferably in a solvent such as dimethylformamide in the presence of 2,4,6-trinitrotoluene and an organic base such as pyridine.

USE: Photoresists, etc.


Inventors:
WATANABE SHIYOUJI
HARASHIMA SUSUMU
TSUKADA NORIAKI
Application Number:
JP14588983A
Publication Date:
February 25, 1985
Filing Date:
August 10, 1983
Export Citation:
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Assignee:
KOGYO GIJUTSUIN
International Classes:
C08F8/00; C08F8/12; C08F8/14; C08F16/00; C08F16/06; C08F218/02; G03F7/038; (IPC1-7): C08F8/14; C08F16/06; G03C1/71
Attorney, Agent or Firm:
Director, Institute of Textile and Polymer Materials, AIST