Title:
INSPECTING METHOD FOR EXPOSURE PATTERN
Document Type and Number:
Japanese Patent JPS60117622
Kind Code:
A
Abstract:
PURPOSE:To inspect the proper correction of a proximity effect and the possibility of the resolution of an exposure pattern under the conditions of some exposure previously and simply by comparing whether the magnified intervals of each pattern for pattern data is more than a set value and inspecting exposure data. CONSTITUTION:Designed pattern data are read from a memory 2, and patterns are magnified until energy strength on the center lines of each pattern reaches threshold values in response to the conditions of exposure and the size of the patterns in an arithmetic circuit 3. Energy strength on the center lines is calculated regarding each pattern first. A difference DELTAl=l-lo between width l at a time when energy strength reaches to the threshold values and drawing pattern width lo is calculated, and several pattern is magnified. Pattern intervals S are inspected regarding each magnified pattern by an inspection arithmetic circuit 5, and a reaching a set value or more of the pattern intervals S is compared and inspected. Extracted pattern data are stored in a second buffer memory 6.
Inventors:
MACHIDA YASUHIDE
NAKAYAMA NORIAKI
NAKAYAMA NORIAKI
Application Number:
JP22560783A
Publication Date:
June 25, 1985
Filing Date:
November 30, 1983
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
G03F1/84; G03F7/20; G06F17/50; H01L21/027; (IPC1-7): H01L21/30; G03F7/20
Domestic Patent References:
| JPS5750433A | 1982-03-24 |
Attorney, Agent or Firm:
Sadaichi Igita