Title:
FORMATION OF TI COATED FILM ON VITREOUS SUBSTRATE
Document Type and Number:
Japanese Patent JPS60180935
Kind Code:
A
Abstract:
PURPOSE: To form the titled titanium coated film having excellent resistance to abrasion on a substrate by sputtering titanium on a vitreous substrate in a gaseous argon atmosphere incorporated with oxygen.
CONSTITUTION: A vitreous substrate (preferably heated to about 30W100°C) is placed in a sputtering vessel, and a voltage is impressed to a Ti target in a gaseous argon atmosphere incorporated with 0.1W0.5% oxygen to form a Ti coated film on the vitreous substrate by using the sputtering method. In addition, the degree of vacuum is preferably regulated to about 1×10-5W5×10-5, and the sputtering rate preferably to about 150W3,000/min.
Inventors:
NOGUCHI SATORU
HANAOKA HIROSHI
TAMAMURA AKIRA
SUZUKI YASUO
HANAOKA HIROSHI
TAMAMURA AKIRA
SUZUKI YASUO
Application Number:
JP3518284A
Publication Date:
September 14, 1985
Filing Date:
February 28, 1984
Export Citation:
Assignee:
ASAHI GLASS CO LTD
International Classes:
C03C17/09; C23C14/14; C23C14/18; (IPC1-7): C03C17/09; C23C14/18
Attorney, Agent or Firm:
Akira Uchida
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