Title:
HARD SUBSTRATE
Document Type and Number:
Japanese Patent JPS594016
Kind Code:
A
Abstract:
PURPOSE:To make a charge-up of electron-beam energy to be discharged without exfoliating a photosensitizer film by previously forming a metallic film made of the same material as a metallic film grown on a glass substrate onto at least one part of the outer edge of the hard substrate while coating the outer edge when the metallic film and the photosensitizer film are grown on the glass substrate in succession and used as the hard substrate for manufacturing a mask for exposure. CONSTITUTION:The glass substrate 11 is coated with the metallic film 12 made of Cr, etc. through sputtering, etc., and the photosensitizer film 13 is formed onto the film 12. The outer edge 21 of the hard substrate formed in this manner is coated with the metallic film 22 similarly consisting of Cr while coating the edge section. Consequently, the film 22 can be connected easily to a ground wire set up at a set position when the hard substrate is set into an exposure device for electron-beam scan. Accordingly, trouble of which the photosensitizer film is exfoliated at every scan and the ground wire is fitted onto the metallic film exposed is eliminated, and processes are simplified remarkably.
Inventors:
ARAIHARA SATOSHI
Application Number:
JP11313182A
Publication Date:
January 10, 1984
Filing Date:
June 30, 1982
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
G03F1/00; G03F1/54; H01J37/317; H01L21/027; (IPC1-7): G03F1/00
Attorney, Agent or Firm:
Koshiro Matsuoka
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