PURPOSE: To raise the forming accuracy of an electric circuit element, and to reduce the variation of a characteristic between each element by using a glass plate whose flatness is extremely good as a substrate, and forming an element of a TET (thin film transistor) array, etc. on said substrate.
CONSTITUTION: The surface of a glass plate on the market is polished to a plane by a usual glass working process, the swell and warping are eliminated, and the surface is finished to a specular surface so that a flatness (a difference of height between the lowest part and the highest part) in a circular surface of 70mm diameter becomes ≤9μ, in an optional area on the surface, and thereafter, it is used as a substrate. By using said substrate, working by a photolitho-etching method, a thin film accumulating method, etc. can be executed with good accuracy, therefore, for instance, an electric circuit substrate for a TFT active matrix type liquid crystal display device is manufactured with good accuracy and yield.
JPH08140341 | MICRO POWER SUPPLY DEVICE USING SWITCHING ELEMENT |
JPS62271470 | SEMICONDUCTOR DEVICE |
JP4145272 | Manufacturing method of semiconductor devices |
TAKAMATSU OSAMU
KITAHARA NOBUKO
SUGATA MASAO
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