PURPOSE: To make curvature compensation adapted to a photometric distribution limited in angle of view, by determining the aperture correction amount (curvature correction amount) of a lens according to the visual field of light measurement.

CONSTITUTION: A signal level compensating resistance VB and the resistance VK in an aperture compensating circuit are adjusted associatively with the selection of an aperture for averaged, partial, or spot light measurement provided to a mask FP for limiting the angle of view. The aperture compensation amount is determined by an aperture F number set to a resistance VA and the resistance VK, and increases according to transition from spot light measurement to averaged light measurement. Consequently, curvature compensations adapted to the photometric distribution having the angle of view limited are made, and the compensation amount of a signal level, the output of light measurement LM, and output of photographic information setting IFS are processed OP1 to perform high-precision exposure control.