ELECTRON BEAM EXPOSURE

Title:

ELECTRON BEAM EXPOSURE

Document Type and Number:

Japanese Patent JPS6146019

Kind Code:

A

Abstract:

PURPOSE:To improve the durability of a charge conducting member using one made of material having high hardness and excellent conductivity, by pressing the change conducting member consisting of diamond ion-implanted on the end face of a substrate so as to remove charges accumulated on the substrate. CONSTITUTION:A charge removing member 6 made of diamond has electrical conductivity given by ion-implanting impurities to make it amorphous. The member 6 is pressed against the end face of a substrate being covered with a silicon oxide film or a silicon nitride film, etc. to remove charges accumulated on the substrate 1. Since a charge removing member 6 employed for electron beam exposure has excellent durability and economical effects, and has a high efficiency in exchanging opration of charge removing members during manufacturing process.

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Inventors:

SUGISHIMA KENJI
MIYAZAWA HITOSHI

Application Number:

JP16866284A

Publication Date:

March 06, 1986

Filing Date:

August 10, 1984

Export Citation:

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Assignee:

FUJITSU LTD

International Classes:

H01L21/027; H01J37/305; H01L21/30; H01L21/66; (IPC1-7): H01J37/305; H01L21/30

Attorney, Agent or Firm:

Sadaichi Igita

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