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Title:
NEGATIVE ION SOURCE
Document Type and Number:
Japanese Patent JPS6020437
Kind Code:
A
Abstract:

PURPOSE: To make etching operation by stabilized negative ion emission performable, by setting up more than two sheets of drawer electrodes in position between an ion generator and a sample, while biasing a first electrode at the ion generator side into being negative and a second electrode at the sample side into being positive, respectively.

CONSTITUTION: A rodlike cathode 22 is placed on the central part of a cylindrical anode 21 and at the lower part, a first electrode 23, a second electrode 24 and a third electrode 25 are all set up after being insulated from the anode 21. And, with a bias power source 28, the first electrode 23 is biased into being negative, while with a bias power source 29, the second electrode 24 is biased into being positive. As for the third electrode 25, it is grounded. With this constitution, a large areal negative ion suitable for ionic etching can be stably secured.


Inventors:
IGAWA EIJI
Application Number:
JP12841783A
Publication Date:
February 01, 1985
Filing Date:
July 14, 1983
Export Citation:
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Assignee:
NIPPON ELECTRIC CO
International Classes:
H01J27/02; H01J37/08; H01J37/248; H01J37/305; H01L21/302; H01L21/3065; (IPC1-7): H01J27/02; H01J37/08; H01J37/248; H01L21/302
Attorney, Agent or Firm:
Uchihara Shin