Title:
FORMATION OF ALIGNING MARK USED IN EXPOSURE TREATMENT
Document Type and Number:
Japanese Patent JPS6024015
Kind Code:
A
Abstract:
PURPOSE:To prevent an object to be exposed in light exposure treatment from affection of processing, by forming an aligning-mark forming layer so as to cover an aligning-mark on the object to be exposed as well as the region surrounding the mark. CONSTITUTION:A lower aligning-mark forming layer 3 is formed for a mask, on a mask substrate 1 and a masking material 2. Then an upper mark forming layer 4 having a predetermined shape is formed on the region of the layer 3. Resist is thereafter applied on it, and a processing pattern is aligned and exposed to light. On this occasion, the region surrounding the aligning-mark is also affected by the light illuminated during the aligning operation, but since it occurs only in the region of the layer 3 which is to be selectively processed with respect to the masking material 2, the substrate 1 is not affected in any way. In the next step, the resist 5 and the layers 3 and 4 are removed to obtain a mask having a predetermined processing pattern. In this way, a mask for optical exposure can be manufactured.
Inventors:
KITAKATA MAKOTO
Application Number:
JP13230683A
Publication Date:
February 06, 1985
Filing Date:
July 20, 1983
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
G03F9/00; H01L21/027; (IPC1-7): H01L21/30; G03F9/00
Attorney, Agent or Firm:
Uchihara Shin