Title:
TOP COATING COMPOSITION FOR PHOTORESIST, AND METHOD FOR FORMING PHOTORESIST PATTERNS USING THE SAME
Document Type and Number:
Japanese Patent JP2006336017
Kind Code:
A
Abstract:
To provide a top coating composition for photoresist which is usable in the immersion lithography and to provide a method for forming photoresist patterns using the same.
The top coating composition comprises a polymer having at least three different structures of repeating groups comprising a first repeating unit having a carboxylic group substituted with an alkyl protection group or an acid-decomposable group, a second repeating group having an acid group and a third repeating group having a polar group, and an organic solvent containing an alcohol.
Inventors:
HATA MITSUHIRO
RYOO MAN-HYOUNG
KIM HYUN-WOO
WOO SANG-GYUN
YOON JIN YOUNG
HAH JUNG-HWAN
RYOO MAN-HYOUNG
KIM HYUN-WOO
WOO SANG-GYUN
YOON JIN YOUNG
HAH JUNG-HWAN
Application Number:
JP2006156204A
Publication Date:
December 14, 2006
Filing Date:
June 05, 2006
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
C09D201/08; C08F220/12; C09D7/12; C09D127/12; C09D127/18; C09D129/10; C09D133/06; C09D133/14; C09D157/00; C09D157/10; G03F7/11; H01L21/027
Attorney, Agent or Firm:
Mikio Hatta
Yasuo Nara
Katsuyuki Utani
Yasuo Nara
Katsuyuki Utani
Previous Patent: JP2006336016
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