To provide a topcoat composition for a photoresist film, the composition having an enhanced function of a compound having an Si atom and/or an F atom to be used together with an alkali-soluble resin in a photoresist film for liquid immersion exposure, and to provide a pattern forming method using the topcoat composition for a resist film.

The topcoat composition for the resist film contains components of: (A) an alkali-soluble resin; (B) a compound having an Si atom and/or an F atom; (C) a solvent having a boiling point of lower than 175C; and (D) an additive expressed by formula (1). The pattern forming method is carried out by using the composition. In formula (1), R1 and R2 each independently represents a 4-6C alkyl group; X represents a 1-4C alkylene group or -(C=O)-Y-(C=O)- group; and Y represents a 1-4C alkylene group.