Title:
位相幾何学的に構成されたポリマーコーティング
Document Type and Number:
Japanese Patent JP4928038
Kind Code:
B2
Abstract:
Sub-micron-structured (nanostructured) polymer film or coatings are made by coating a substrate with a mixture of materials. One of the materials is removed using a selective solvent, leaving pores or other nanostructure. The substrate may be grooved, providing a competing nanostructure. The coating may act as an antireflective coating, optical retarder, optical diffuser, or orientation layer.
Inventors:
Seiberle Hubert
Shard martin
Ibn-El Haji Mohamed
Benecke Karsten
SCHMIDT, Klaus
Shard martin
Ibn-El Haji Mohamed
Benecke Karsten
SCHMIDT, Klaus
Application Number:
JP2001531936A
Publication Date:
May 09, 2012
Filing Date:
October 18, 2000
Export Citation:
Assignee:
ROLIC AG
International Classes:
G02B1/11; G02B5/02; B29C41/00; C09K19/54; G02B1/10; G02B5/18; G02B5/30; G02F1/1337; G02F1/139
Domestic Patent References:
JPH01234433A | 1989-09-19 | |||
JPH10226514A | 1998-08-25 | |||
JPH04121701A | 1992-04-22 | |||
JPH10282305A | 1998-10-23 | |||
JPH09171172A | 1997-06-30 | |||
JPH063501A | 1994-01-14 | |||
JPH10333133A | 1998-12-18 | |||
JPH01131257A | 1989-05-24 |
Attorney, Agent or Firm:
Minoru Nakamura
Fumiaki Otsuka
Sadao Kumakura
Shishido Kaichi
Hideto Takeuchi
Toshio Imajo
Nobuo Ogawa
Village shrine Atsuo
Takaki Nishijima
Atsushi Hakoda
Fumiaki Otsuka
Sadao Kumakura
Shishido Kaichi
Hideto Takeuchi
Toshio Imajo
Nobuo Ogawa
Village shrine Atsuo
Takaki Nishijima
Atsushi Hakoda