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Title:
位相幾何学的に構成されたポリマーコーティング
Document Type and Number:
Japanese Patent JP4928038
Kind Code:
B2
Abstract:
Sub-micron-structured (nanostructured) polymer film or coatings are made by coating a substrate with a mixture of materials. One of the materials is removed using a selective solvent, leaving pores or other nanostructure. The substrate may be grooved, providing a competing nanostructure. The coating may act as an antireflective coating, optical retarder, optical diffuser, or orientation layer.

Inventors:
Seiberle Hubert
Shard martin
Ibn-El Haji Mohamed
Benecke Karsten
SCHMIDT, Klaus
Application Number:
JP2001531936A
Publication Date:
May 09, 2012
Filing Date:
October 18, 2000
Export Citation:
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Assignee:
ROLIC AG
International Classes:
G02B1/11; G02B5/02; B29C41/00; C09K19/54; G02B1/10; G02B5/18; G02B5/30; G02F1/1337; G02F1/139
Domestic Patent References:
JPH01234433A1989-09-19
JPH10226514A1998-08-25
JPH04121701A1992-04-22
JPH10282305A1998-10-23
JPH09171172A1997-06-30
JPH063501A1994-01-14
JPH10333133A1998-12-18
JPH01131257A1989-05-24
Attorney, Agent or Firm:
Minoru Nakamura
Fumiaki Otsuka
Sadao Kumakura
Shishido Kaichi
Hideto Takeuchi
Toshio Imajo
Nobuo Ogawa
Village shrine Atsuo
Takaki Nishijima
Atsushi Hakoda