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Title:
TRANSLUCENT CONDUCTIVE THIN FILM, ITS MANUFACTURING METHOD, AND TRANSPARENT ELECTROMAGNETIC WAVE SHIELDING FILM
Document Type and Number:
Japanese Patent JP2009117277
Kind Code:
A
Abstract:

To prevent a plating failure of a translucent conductive thin film which is made by a procedure of exposure-chemical development-physical development-electroplating using a silver halide photosensitive material.

A manufacturing method of the translucent conductive thin film which carries out mesh-like exposure to a transparent support coated with the silver halide photosensitive material, and then forms a conductive mesh by a procedure of chemical development-physical development-electroplating includes treating a liquid containing an alkali metal or an alkaline earth metal ion after physical development.


Inventors:
Uno, Mitsuhiko
Sakata, Kazuhiko
Uda, Takashi
Goto, Masanori
Application Number:
JP2007000291640
Publication Date:
May 28, 2009
Filing Date:
November 09, 2007
Export Citation:
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Assignee:
KONICA MINOLTA HOLDINGS INC
International Classes:
H01B13/00; G03C5/26; H01B5/14; H05K9/00