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Title:
TRANSPARENT BLOCK FOR APPRECIATION, AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2011016320
Kind Code:
A
Abstract:

To provide a method for manufacturing a transparent block for appreciation of high appearance characteristics improving the arrangement balance of an ornament in the transparent block for appreciation by easily positioning the ornament when filling a transparent solidifying material to enclose the ornament.

The method for manufacturing the transparent block for appreciation includes processes for putting molten paraffin wax 2 in a transparent container 1 and solidifying the paraffin wax 2 to form a transparent layer 2A specifying the arranged position of a flower 3 in the transparent container 1; arranging the flower 3 away from the internal wall of the transparent container 1 through the transparent layer 2A; and filling paraffin wax 2 in the transparent container 1 to enclose the flower 3. The transparent layer 2A can thereby specify the arranged position of the flower 3, for instance, to manufacture the transparent block 10A for appreciation excelling in arrangement balance.


Inventors:
OTOMO HIROTAKA
Application Number:
JP2009163364A
Publication Date:
January 27, 2011
Filing Date:
July 10, 2009
Export Citation:
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Assignee:
TENMAC INC
International Classes:
B44C3/00; B44C5/06
Domestic Patent References:
JPS581599A1983-01-06
JPH08132800A1996-05-28
JPS5737324B21982-08-09
JPH11511498A1999-10-05
JPH1111096A1999-01-19
JP2008254229A2008-10-23
JPS4327839B1
JPS4422629B1
JPS57165455U1982-10-19
JPH0417996U1992-02-14
JPS57201399U1982-12-21
JPH08268801A1996-10-15
JPS5563799U1980-05-01
Attorney, Agent or Firm:
Nobuo Nakamura
Nishizawa Issei
Shoichi Masuka