Title:
TRANSPARENT OXIDE LAMINATED FILM, MANUFACTURING METHOD OF TRANSPARENT OXIDE LAMINATED FILM, SPUTTERING TARGET AND TRANSPARENT RESIN SUBSTRATE
Document Type and Number:
Japanese Patent JP2019183244
Kind Code:
A
Abstract:
To provide a transparent oxide laminated film having excellent transparency, excellent steam barrier performance or oxygen barrier performance in direct-current sputtering having high mass productivity; and to provide a manufacturing method of the transparent oxide laminated film, a sputtering target and a transparent resin substrate.SOLUTION: A transparent oxide laminated film formed by laminating a plurality of layers of a transparent oxide film containing Zn and Sn has two or more layers of an amorphous film in which a metallic atom number ratio of Zn and Sn, namely Sn/(Zn+Sn), is 0.18 or more and 0.29 or less.SELECTED DRAWING: None
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Inventors:
KUWAHARA MASAKAZU
NITO SHIGEO
NITO SHIGEO
Application Number:
JP2018078442A
Publication Date:
October 24, 2019
Filing Date:
April 16, 2018
Export Citation:
Assignee:
SUMITOMO METAL MINING CO
International Classes:
C23C14/08; B32B9/00; C23C14/06; C23C14/34
Domestic Patent References:
| JP2013047361A | 2013-03-07 | |||
| JP2017145185A | 2017-08-24 |
Attorney, Agent or Firm:
Akira Koike
Takaaki Kono
Hiroyuki Murakami
Takaaki Kono
Hiroyuki Murakami