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Title:
TREATING METHOD OF LITHOGRAPHIC MATERIAL NOT REQUIRING DAMPENING WATER
Document Type and Number:
Japanese Patent JPS5570846
Kind Code:
A
Abstract:

PURPOSE: To let the protecting film of the captioned lithographic material to be readily stripped by forming a photosensitive image forming layer and protecting film subsequently on a silicone rubber layer lined to a substrate and exposing the entire surface with active rays to the extent of not affecting the image formation.

CONSTITUTION: Such a silicone rubber layer as the one having repetitive units expressed by the formula (R is alkyl of C1WC10, phenyl) is formed usually to a thickness of 0.5W100μ on paper, plastic film or metal plate of thicknesses about 10μW5mm. Next, a photosensitive image forming layer containing photosensitive material is formed to a thickness of about 0.1W50μ and a protecting film such as of polyethylene terephthalate or polyvinyl chloride film is formed to a thickness of about 5W200μ. The entire surface of the resultant protecting film for the lithographic material of not requiring dampening water is exposed with active rays usually for about 1W20 seconds to the extent of not affecting the image formation.


Inventors:
KINASHI TAKAO
Application Number:
JP14424978A
Publication Date:
May 28, 1980
Filing Date:
November 24, 1978
Export Citation:
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Assignee:
TORAY INDUSTRIES
International Classes:
G03F7/20; G03F7/00; G03F7/075; G03F7/09; (IPC1-7): G03F7/02
Domestic Patent References:
JPS4894503A1973-12-05
JPS5287022A1977-07-20
JPS52134504A1977-11-10