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Title:
TREATMENT DEVICE AND TREATMENT METHOD FOR TREATED SUBSTANCE
Document Type and Number:
Japanese Patent JP2006329448
Kind Code:
A
Abstract:

To provide a treatment device and a treatment method for a treated substance capable of preventing drop-out and stably changing industrial waste into gas plasma and ionizing it, starting operation again without waiting for a long time after drop-out, and reducing a working load in taking out the treated object.

This treatment device P for the treated substance is composed of a combustion mechanism 2 for burning the treated substance after pretreatment by a heat source by primary arc discharge, a primary arc discharge heating mechanism 3 supplying the heat source to the combustion mechanism and heating the treated substance by the primary arc discharge, a secondary arc discharge heating mechanism 4 heating the treated substance passed through the primary arc discharge heating mechanism by secondary arc discharge, a cooling mechanism 5 cooling the treated substance passed through the secondary arc discharge heating mechanism, and an adsorbing mechanism 6 adsorbing the treated substance passed through the cooling mechanism.


Inventors:
TSUMAGARI TATSUICHIRO
Application Number:
JP2005149381A
Publication Date:
December 07, 2006
Filing Date:
May 23, 2005
Export Citation:
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Assignee:
TSUMAGARI TATSUICHIRO
KANISAWA KAZUO
International Classes:
F27D11/08; B09B3/00; F27B17/00; F27D11/10; F27D17/00
Attorney, Agent or Firm:
Yoshihiro Sato