Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
TREATMENT OF HIGH TEMPERATURE GAS AND DEVICE THEREFOR
Document Type and Number:
Japanese Patent JPH07194963
Kind Code:
A
Abstract:

PURPOSE: To improve a method and device for treating high temp. process gas generated in high temp. process in a circulation type fluidized bed.

CONSTITUTION: In a circulation type fluidized bed reactor, a reactor 10 for treating the high temp. gas generated from the high temp. process is provided with a mixing chamber 12, a particle separator 16, and a return duct 18 for returning the circulating mass from the particle separator 16 to the mixing chamber 12. Then the return opening 24 of the return duct 18 is so arranged that the flow of solids entering the mixing chamber via the opening is directed substantially downwardly. The inlet 22 for the high temp. process gas is so arranged as to allow the high temp. process gas to flow into the mixing chamber 12 as a substantially upwardly directed solids flow so that the solids flow comes into contact with the gas flow.


Inventors:
TEIMO HITSUPENEN
Application Number:
JP13038394A
Publication Date:
August 01, 1995
Filing Date:
June 13, 1994
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
AHLSTROEM OY
HISMELT CORP PTY LTD
International Classes:
B01D45/02; B01D45/12; B01D51/04; B01J8/18; B01J8/24; B01J8/38; F23C10/18; F27B15/00; F27B15/10; F27B15/12; F27D17/00; (IPC1-7): B01J8/24; F23C11/02; F27B15/00; F27B15/10; F27B15/12; F27D17/00
Attorney, Agent or Firm:
Takashi Ishida (3 others)