To provide a treatment liquid jetting nozzle which can uniformly supply treatment liquid on a substrate of large area, and a substrate treatment equipment provided with the nozzle.

A plurality of development nozzles 10 are fixed on the lower surface of a development nozzle holding part member 5 fixed to the tip of a development nozzle arm, along the radial direction of a substrate 1. Each of the development nozzles 10 has an umbrella part 12 whose diameter is gradually increased toward below, in the central part of the lower surface of a nozzle main body 11, and a plurality of jetting holes 13 are formed on the nozzle main body 11 on the periphery of the top part of the umbrella part 12. Jet flow rates of the respective development nozzles 10 can be independently controlled by connecting the respective development nozzles 10 to a buffer tank 15 via the respective mass flow controllers 14.