Title:
TREATMENT OF ORGANOARSENIC COMPOUND-CONTAINING WASTE LIQUID
Document Type and Number:
Japanese Patent JP3748649
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To efficiently separate arsenic from a difficult-to-decompose organoarsenic compd.-contg. waste liq. by adding NaClO to the waste liq. with the pH specified, adding an excess of CaCO3 to suspend the insoluble CaCO3 in the liq. and then separating solid from liq.
SOLUTION: The waste liq. contg. an organoarsenic compd. such as dimethylarsinic acid (cacodylid acid) is treated. In this case, when the waste liq. is kept at > pH 5, an acid such as hydrochloric acid is added to control the liq. to ≤ pH 5, preferably to about pH 4 or pH 3-4.5, and NaClO is added. In this case, when the waste liq. does not contain iron ion, a ferrous or ferric salt is added to incorporate iron ion into the liq. Subsequently, powdery CaCO3 is added in excess and agitated to form a floc having adsorbed arsenic in the liq. When the floc as such is difficult to filter off, an ordinary high molecular flocculant is added, and then solid is separated from liq. filtration, for example.
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Inventors:
Toshimune Kimura
Hitoshi Mikada
Hitoshi Mikada
Application Number:
JP35637596A
Publication Date:
February 22, 2006
Filing Date:
December 26, 1996
Export Citation:
Assignee:
DOWA MINING CO.,LTD.
International Classes:
B01D21/01; C02F1/62; C02F1/52; C02F1/76; (IPC1-7): C02F1/62; B01D21/01; C02F1/52; C02F1/76
Domestic Patent References:
| JP158109C2 | ||||
| JP59203692A | ||||
| JP57010384A |
Attorney, Agent or Firm:
Kenji Wada
Koji Hagiwara
Koji Hagiwara