Title:
TREATMENT SYSTEM
Document Type and Number:
Japanese Patent JP3416397
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a treatment system allowing prevention of intrusion of particles into the system with no increase of a clean air amount inside the system.
SOLUTION: In a cassette station 10, an upper space of a cassette mounting base 20 and a moving space of a wafer carrying arm 22 are partitioned each other by a partition plate 11 so that the down flow air may separately flow in both spaces. The plate 11 is plovided with a plurality of opening parts. A wafer carrier 22 carries in and out a semiconductor wafer through these opening parts to a wafer cassette CR.
Inventors:
Hiroshi Araya
Takayuki Katano
Junichi Kitano
Takayuki Katano
Junichi Kitano
Application Number:
JP13726396A
Publication Date:
June 16, 2003
Filing Date:
May 30, 1996
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G03F7/30; H01L21/02; H01L21/027; H01L21/677; H01L21/68; (IPC1-7): H01L21/02; G03F7/30; H01L21/027; H01L21/68
Domestic Patent References:
| JP1241840A | ||||
| JP518576A | ||||
| JP5237995A | ||||
| JP8111449A | ||||
| JP8153697A | ||||
| JP21113A | ||||
| JP22605A |
Attorney, Agent or Firm:
Saichi Suyama