Title:
TREATMENT OF USED DEVELOPER OF PHOTOSENSITIVE COMPOSITION CONTAINING INORGANIC PARTICLE
Document Type and Number:
Japanese Patent JP2000070937
Kind Code:
A
Abstract:
To provide a treating method of a used developer by which the cost for the treatment of waste liquids relating to a used developer produced by high pressure spray development of a photosensitive compsn. containing inorg. fine particles can be reduced and preservation of water environment is assured.
The used developer produced by high pressure spray development of a photosensitive compsn. containing inorg. fine particles is subjected to reverse osmosis treatment to decrease the concn. of lead compds. in the developer. Especially, the reverse osmosis membrane used shows 30 to 90% removing rate of NaCl when 1000 mg/L NaCl aq. soln. is treated at 25°C under 7 kg/cm2 pressure.
Inventors:
TAKAGI YOSHIHIRO
Application Number:
JP24360098A
Publication Date:
March 07, 2000
Filing Date:
August 28, 1998
Export Citation:
Assignee:
FUJIFILM OLIN CO LTD
International Classes:
G03F7/30; B01D61/02; C02F1/44; C02F1/62; (IPC1-7): C02F1/44; B01D61/02; C02F1/62; G03F7/30
Attorney, Agent or Firm:
Tadashi Hagino (2 outside)