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Title:
二層構造の光触媒酸化チタン膜及びその製造方法
Document Type and Number:
Japanese Patent JP4599547
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To manufacture a titanium dioxide film which has high photocatalytic activity by forming a film of duplicate structure of Ti2 O3 film and TiO2 film which are subjected to epitaxial growth with the laser abrasion film forming method which allows a manufacture of a flat film with extremely thin thickness as much as several ten nm (nanometer). SOLUTION: This photocatalyst titanium oxide film and producing method thereof features that the Ti2 O3 film which is subjected to epitaxial growth is formed on a sapphire substrate end, further, the TiO2 film which is subjected to epitaxial growth is formed thereon.

Inventors:
Haruya Yamamoto
Yasushi Sumita
Application Number:
JP2001300852A
Publication Date:
December 15, 2010
Filing Date:
September 28, 2001
Export Citation:
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Assignee:
Japan Atomic Energy Agency
International Classes:
B01D53/86; B01D53/94; B01J35/02; B01J21/06; B01J32/00; B01J37/02; C01G23/04; C23C14/08; C23C14/28; C30B29/16
Domestic Patent References:
JP2003063892A
JP2002031612A
JP2001253007A
JP2001246265A
Attorney, Agent or Firm:
Kazuo Shamoto
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Shurin Sakurai
Fujihiro Kanda
Hideo Tanaka
Shinya Hosokawa
Norihiro Fukasawa
Koji Hirayama