Title:
超微細パターン蒸着装置、これを用いた超微細パターン蒸着方法及び超微細パターン蒸着方法によって製作された電界発光表示装置
Document Type and Number:
Japanese Patent JP6827455
Kind Code:
B2
Abstract:
A deposition apparatus, such as an ultra-fine pattern deposition apparatus is provided. A deposition apparatus includes a base substrate, a heating assembly, a deposition source material and a pattern guide. The heating assembly has at least a part thereof included in the base substrate. The deposition source material is disposed on the heating assembly. The pattern guide overlies the base substrate and has a portion thereof above the heating assembly and the deposition source material. The pattern guide has an opening including a laterally recessed lower region and an upper region. The opening extends from an upper surface of the base substrate to an upper surface of the pattern guide. The lower region of the opening is wider than the upper region of the opening, and the opening of the pattern guide is configured to guide a material emitted from the deposition source material to a target region on a target substrate that is spaced apart from the base substrate.
Inventors:
Van, Hyunsuk
Yang, Jun Hwan
Choi, Dong Wook
Yang, Jun Hwan
Choi, Dong Wook
Application Number:
JP2018205137A
Publication Date:
February 10, 2021
Filing Date:
October 31, 2018
Export Citation:
Assignee:
LG Display Company Limited
International Classes:
C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
| JP2007154253A | ||||
| JP2002302759A | ||||
| JP2010050087A | ||||
| JP2001295027A |
Foreign References:
| WO2011122018A1 |
Attorney, Agent or Firm:
Sonoda/Kobayashi Patent Business Corporation