To provide an ultrasonic cleaning device for emitting ultrasonic waves effectively all over a face the be cleaned of a wafer to enhance the cleaning effect.

Supporting members 28a and 28b for holding a wafer 7 in a cleaning liquid 6 in the given posture are set on the positions of respectively different height, and ultrasonic protective plates 24a and 24b are provided respectively on the front faces of ultrasonic wave generators 23 and 24 set on both side walls of an ultrasonic wave tank 2. The ultrasonic wave protective plates are movable respectively to the front faces of the ultrasonic wave generators and to the standby positions retracted from the front faces, and when ultrasonic waves are emitted from the other side, the plates are positioned on the front faces. The ultrasonic wave generators 23a and 23b are actuated alternately, and ultrasonic waves are emitted all over a face 7a to be cleaned of the wafer 7 by emitting ultrasonic waves from the other side to ultrasonic wave unreceived areas 29a (29b) not having received ultrasonic waves when the ultrasonic waves are emitted from one side to the wafer 7.