Title:
UNDERLAYER COMPOSITION AND PATTERNING METHOD
Document Type and Number:
Japanese Patent JP2022041925
Kind Code:
A
Abstract:
To provide an underlayer composition and a patterning method.SOLUTION: An underlayer composition contains a polymer having a repeat unit of formula (1) (where Ar is a monocyclic or polycyclic C5-60 aromatic group, the aromatic group includes one or more aromatic ring heteroatoms, a heteroatom-bearing substituent, or a combination of them; X is C or O; R1, R2, Ra, and Rb are as described in the Specifications; optionally, R1 and R2 may form a 5-7 membered ring together; optionally, one of R11-R13 may form a 5-7 membered ring together with R1; Ra and Rb may optionally form a 5-7 membered ring together; one of Ra and Rb may optionally form a 5-7 membered ring together with R2; if X is O, Ra and Rb are absent).SELECTED DRAWING: None
Inventors:
JOSHUA KAITZ
LIU SHENG
CUI LI
YAMADA SHINTARO
JAMES F CAMERON
EMAD AQAD
KE IOU-SHENG
SUZANNE M COLEY
LIU SHENG
CUI LI
YAMADA SHINTARO
JAMES F CAMERON
EMAD AQAD
KE IOU-SHENG
SUZANNE M COLEY
Application Number:
JP2021133938A
Publication Date:
March 11, 2022
Filing Date:
August 19, 2021
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
G03F7/11; C08G2/18; C08G8/04; G03F7/26; H01L21/027
Domestic Patent References:
| JP2005221515A | 2005-08-18 | |||
| JPH11349654A | 1999-12-21 |
Foreign References:
| WO2018056279A1 | 2018-03-29 | |||
| WO2006120845A1 | 2006-11-16 | |||
| WO2019225615A1 | 2019-11-28 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office