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Title:
UNEVEN PATTERN INPUT DEVICE
Document Type and Number:
Japanese Patent JPS5513446
Kind Code:
A
Abstract:

PURPOSE: To obtain a 3-dimensional pattern input device which picks and supplies optically the uneven pattern on the soft substance such as the rubber stamp, the fingerprint or the like directly and in real time.

CONSTITUTION: Full reflection beam A is caused on interface 22 between air 21 and transparent material 20 such as the glass or the like with the incident angle exceeding critical angle Θ0, and no full reflection light is caused at the area of the interface where the rubber, the skin and the like adheres owing to the mutual refractive indexes of the media. When the fingerprints are gathered based on the above theory, parallel luminous flux 30 given from the light source enters optical device 31 featuring the transmissive and reflective properties like an orthogonal prisim or the like. And in case the beam enters slope 31c adhered to subject 32 with an incident angle more than the critical angle, the pattern information composed to the full reflection beam and non-full reflection beam can be obtained according to the fingerprint and in the form of emission light 33. This information can be supplied to processor 3 via TV camera 2.


Inventors:
YAMAGUCHI TETSUO
Application Number:
JP8518478A
Publication Date:
January 30, 1980
Filing Date:
July 14, 1978
Export Citation:
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Assignee:
KOGYO GIJUTSUIN
International Classes:
G01B11/24; G06K9/20; G01B11/30; G06T1/00; G06T7/00; (IPC1-7): G06K9/20
Domestic Patent References:
JP45038480A
JPS5134680U1976-03-15
JPS5223018U1977-02-18
JPS52149922A1977-12-13



 
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