Title:
UV-DECOMPOSABLE MOLECULE AND PHOTOPATTERNABLE MONOMOLECULAR FILM FORMED THEREFROM, AND FILM PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2009029815
Kind Code:
A
Abstract:
To provide a method for forming a film pattern photopatternable in a short time by using a low energy UV, that is, UV of a comparatively long wave length.
The method for forming a film pattern comprises a step ejecting liquid drops containing a compound represented by formula (0) [wherein X is a structure having reactivity to a functional group on a solid surface; Y is a decomposable structure itself; and Z is a structure capable of changing physical properties of the solid surface or a reactive structure] on a solid surface having the functional group.
Inventors:
FUKUSHIMA HITOSHI
TAKIGUCHI HIROSHI
SHIMODA TATSUYA
BUSHBY RICHARD JAMES
EVANS STEPHEN
JEYADEVAN J P
CRITCHLEY KEVIN
MASUDA TAKASHI
TAKIGUCHI HIROSHI
SHIMODA TATSUYA
BUSHBY RICHARD JAMES
EVANS STEPHEN
JEYADEVAN J P
CRITCHLEY KEVIN
MASUDA TAKASHI
Application Number:
JP2008213931A
Publication Date:
February 12, 2009
Filing Date:
August 22, 2008
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
C07D207/46; H01L21/027
Attorney, Agent or Firm:
Yoshiyuki Inaba
Katsuro Tanaka
Shinji Oga
Katsuro Tanaka
Shinji Oga