Title:
VACUUM APPARATUS
Document Type and Number:
Japanese Patent JPH02233133
Kind Code:
A
Abstract:
PURPOSE: To easily achieve a specific high vacuum degree by forming with nitride the surface of vacuum instrument including at least the inner wall of a vacuum container.
CONSTITUTION: The surface of a vacuum instrument including at least the inner wall of a vacuum container is formed with nitride (e.g. Si3N4). This nitride is formed by a CVD method, a sputtering vapor deposition method or a plasma spraying method. As a result, when a vacuum state is obtained by a vacuum apparatus using a turbo molecular pump or an ion pump, effect capable of easily reducing a vacuum degree to 10-12-10-5Torr is obtained and the temp. in epitaxial growing treatment can be lowered and the purity of gas can be enhanced.
Inventors:
IWAMATSU SEIICHI
Application Number:
JP5423389A
Publication Date:
September 14, 1990
Filing Date:
March 07, 1989
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
B01J3/00; C23C14/00; C23C14/22; (IPC1-7): B01J3/00; C23C14/22
Attorney, Agent or Firm:
Kisaburo Suzuki (1 outside)