Title:
VACUUM CHAMBER
Document Type and Number:
Japanese Patent JP2010040990
Kind Code:
A
Abstract:
To provide a vacuum chamber having a differential gas discharge seal such that a substrate is carried in and out in a state where desired vacuum pressure is maintained in a process room.
The vacuum chamber 10 includes a floating chuck 40 as a substrate conveying mechanism capable of conveying the substrate W in a prescribed direction so that the substrate W may pass through the process room P, and the differential gas discharge seal 20 disposed at a periphery of the process room P and sealing a gap between the conveyed substrate W and a seal surface 21 opposed to the substrate W, wherein the floating chuck 40 also functions as a distortion removing means of removing distortion of the conveyed substrate W.
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Inventors:
NAKAMURA TAKESHI
MATSUZAKA MASAAKI
MATSUZAKA MASAAKI
Application Number:
JP2008205508A
Publication Date:
February 18, 2010
Filing Date:
August 08, 2008
Export Citation:
Assignee:
NSK LTD
International Classes:
H01L21/027; B01J3/02; B01J3/03; B65G49/07; F16J15/40; F16J15/447; H01L21/677
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Hironori Honda
Toshimitsu Ichikawa