To improve the stain of cleaning caused by exhaust accompanying the opening and closing of a chamber when a vapor deposition system is used in a clean room environment.

In the vacuum deposition method, a vapor deposition material and the object to be vapor-deposited are set inside a chamber, and a thin film is deposited on the object to be vapor-deposited by the vapor deposition material. In this case, the inside of the chamber is displaced from a vacuum environment to an atmospheric environment directly before the opening of the chamber, and the gas remaining inside the chamber is forcedly exhausted once more.