To provide a vacuum deposition system capable of improving a throughput.

Substrate holders 21A, 21B, 21C, and 21D where holes and substrates are alternately provided on the same radius at the same intervals, and a dummy holder 27 provided with a plurality of holes on the same radius at the intervals double the above intervals are fitted to a supporting stem 22, so as to be stacked in such a manner that the dummy holder 27 is located at the side of a crucible 7. They are rotated around the supporting stem 22 in such a manner that the substrate in each substrate holder communicates with each hole in the dummy holder 27 successively, and film deposition to the substrate fitted to each substrate holder is performed.