Title:
VACUUM DEVICE
Document Type and Number:
Japanese Patent JP2619231
Kind Code:
B2
Abstract:
PURPOSE: To provide a vacuum device capable of realizing ultra-high vacuum using a lightweight AN alloy good in processability.
CONSTITUTION: When an Al alloy to which Si, Cu, Zn, Fe, Ni, Mn or Cr is added as a strength improving component is used in a vacuum device, Be, Ca, Sm, Tm or Yb or Ba, Li or Sr is added to the Al alloy in an amt. of 3wt.% or less as a getter component. By this method, the vacuum degree in the vacuum device can be enhanced or high vacuum can be obtained by short-time heat treatment.
Inventors:
Michihiko Inaba
Suzuki Isao
Suzuki Isao
Application Number:
JP21025195A
Publication Date:
June 11, 1997
Filing Date:
July 27, 1995
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
B01J3/00; B01J20/02; C22C21/00; H01J29/86; (IPC1-7): B01J3/00; B01J20/02; C22C21/00; H01J29/86
Other References:
【文献】「真空」第26巻第5号第9~13頁(1983)
Attorney, Agent or Firm:
Togawa Hideaki
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