To provide a vacuum drying apparatus that can restrict uneven drying on a coating film.
A vacuum drying apparatus includes a chamber 2 accommodating a substrate therein and by reducing pressure inside the chamber 2 lower than atmospheric pressure, coating on the substrate accommodated within the chamber 2 is dried. The chamber 2 includes a chamber body 3 and a chamber cover 4, and the inside of the chamber 2 is sealed by abutting the chamber body 3 and the chamber cover 4 The chamber cover 4 includes a top plate 41, a cover-like retaining part 6 is provided which covers the top plate 41 from a side of the top plate 41 opposed to the inside of the chamber 2. The cover-like retaining part 6 forms a closed space R between the cover-like retaining part and the top plate 41 and pressure in the space R is lower than or equal to atmospheric pressure.
KAMIBAYASHI HIROKAZU
KONDO SONSHI
TAKEI TAKASHI
